Erase method of non-volatile memory device

ABSTRACT

A non-volatile memory device includes a memory cell array including a plurality of cell strings, each of the plurality of cell strings includes a gate-induced drain leakage (GIDL) transistor and a memory cell group, and a control logic to apply a voltage to each of the plurality of cell strings. The control logic performs a first erase operation of erasing the memory cell groups of each of the plurality of cell strings, a first verification operation of detecting erase results of the memory cell groups of each of the plurality of cell strings, and a program operation of programming the GIDL transistors of some of the plurality of cell strings.

CROSS-REFERENCE TO RELATED APPLICATIONS

This application is a continuation of pending U.S. application Ser. No.16/693,925, filed on Nov. 25, 2019, the entire contents of which ishereby incorporated by reference.

Korean Patent Application No. 10-2019-0032270, filed on Mar. 21, 2019,in the Korean Intellectual Property Office, and entitled: “NonvolatileMemory Device and Erase Method Thereof,” is incorporated by referenceherein in its entirety.

BACKGROUND 1. Field

Embodiments relate to a non-volatile memory device and an erase methodof the non-volatile memory device. More particularly, embodiments relateto a non-volatile memory device that reduces or suppresses an occurrenceof deep erase cell and a method of operating the same.

2. Description of the Related Art

A semiconductor memory device may be broadly divided into a volatilesemiconductor memory device and a non-volatile semiconductor memorydevice. The non-volatile memory device may include a ROM (Read OnlyMemory), a PROM (Programmable ROM), an EPROM (Electrically ProgrammableROM), an EEPROM (Electrically Erasable and Programmable ROM), a flashmemory, a PRAM (Phase-change RAM), a MRAM (Magnetic RAM), a RRAM(Resistive RAM), a FRAM (Ferroelectric RAM), and the like. Recently, asthe demand for high integration of memory devices increases, multi-bitflash memory devices that store multi-bits in one memory cell areuniversalized.

SUMMARY

According to some embodiments, a non-volatile memory device includes amemory cell array including a plurality of cell strings, each of theplurality of cell strings includes a gate-induced drain leakage (GIDL)transistor and a memory cell group, and a control logic configured toapply a voltage to each of the plurality of cell strings. The controllogic performs a first erase operation of erasing the memory cell groupsof each of the plurality of cell strings, a first verification operationof detecting erase results of the memory cell groups of each of theplurality of cell strings, and a program operation of programming theGIDL transistors of some of the plurality of cell strings.

According to some embodiments, a non-volatile memory device includes afirst cell string connected to a first bit line and including a firstmemory cell group and a first a gate-induced drain leakage (GIDL)transistor, and a control logic configured to apply a voltage to thefirst bit line. The control logic performs a program operation ofprogramming the first GIDL transistor, and an erase operation of erasingthe first memory cell group, using the programmed first GIDL transistor.

According to some embodiments, a non-volatile memory device includes afirst cell string connected to a first bit line and including a firstmemory cell group and a first a gate-induced drain leakage (GIDL)transistor, a second cell string connected to a second bit line andincluding a second memory cell group and a second GIDL transistor, and acontrol logic configured to apply a voltage to the first and second bitlines. The control logic programs the first and second GIDL transistorsat a first level, the control logic programs the first GIDL transistorat a second level greater than the first level, and the control logicerases the first and second memory cell groups, using the first andsecond GIDL transistors.

BRIEF DESCRIPTION OF THE DRAWINGS

Features will become apparent to those of skill in the art by describingin detail exemplary embodiments with reference to the attached drawingsin which:

FIG. 1 illustrates a memory system according to some embodiments.

FIG. 2 illustrates a memory device of the memory system of FIG. 1.

FIG. 3 illustrates a perspective view of a memory block of the memorycell array of FIG. 2.

FIG. 4 illustrates a circuit diagram of the memory block of FIG. 3.

FIG. 5 illustrates a circuit diagram of the cell strings connected toone string selection line in the memory block of FIG. 4.

FIG. 6 illustrates one cell string included in the cell string of FIG.5.

FIG. 7 illustrates a GIDL transistor included in the cell string of FIG.6.

FIG. 8a illustrates the operation of the GIDL transistor of FIG. 7.

FIG. 8b illustrates an enlarged view of a region A of FIG. 8 a.

FIGS. 9a and 9b are diagrams illustrating threshold voltage illustratingthe erase work of the memory device of FIG. 2.

FIG. 10 is a diagram for illustrating the advantageous effect of theerase work performed by the memory device of FIG. 2.

FIG. 11 illustrates one side of the memory block in the memory cellarray of the memory device according to some embodiments.

FIG. 12 illustrates a flowchart for explaining the erase method of thememory device according to some embodiments.

FIG. 13 illustrates a flowchart for explaining the erase method of thememory device according to some embodiments.

DETAILED DESCRIPTION

FIG. 1 illustrates a memory system according to some embodiments.Referring to FIG. 1, the memory system may include a memory controller10 and a non-volatile memory device 20.

The memory controller 10 may control the operation of the non-volatilememory device 20. Specifically, the memory controller 10 may provide acommand CMD, an address ADDR and a control signal CTRL alonginput/output lines connected to the non-volatile memory device 20. Also,the memory controller 10 may provide or receive data DATA along theinput/output lines connected with the non-volatile memory device 20.

The command CMD provided by the memory controller 10 to the non-volatilememory device 20 may include read, write, erase, and the like.

The non-volatile memory device 20 may store data or provide stored dataon the basis of the address ADDR, command CMD, and control signal CTRLprovided from the memory controller 10.

The non-volatile memory device 20 may include, for example, a NAND flashmemory, a vertical NAND flash memory (VNAND), a NOR flash memory, aresistor RAM (RRAM), a phase change memory (RRAM), a magnetoresistivememory (MRAM), a ferroelectric memory (FRAM), a spin injectionmagnetization reversal memory (Spin STT-RAM) and the like. Hereinafter,embodiments will be described by taking an example in which thenon-volatile memory device 20 is a vertical NAND flash memory (VNAND),but may be applied to other types of memories.

FIG. 2 illustrates a memory device of the memory system of FIG. 1.Referring to FIGS. 1 and 2, the non-volatile memory device 20 mayinclude a voltage generator 110, a row decoder 120, a data input/outputcircuit 130, a page buffer circuit 140, a control logic 150, and amemory cell array 160.

The voltage generator 110 may generate the operating voltage necessaryfor the operation of the non-volatile memory device 20, using the powersupply voltage. The operating voltage may include, e.g., a programvoltage, an inhibit voltage, a read voltage, a read pass voltage, a bitline voltage, a common source line voltage, and the like, and variouscombinations thereof.

The row decoder 120 may be connected to a memory cell array 160 via agate-induced drain leakage (GIDL) line GL, a string selection line SSL,a word line WL, a ground selection line GSL, and a common source lineCSL. The row decoder 120 may receive the operating signal from thecontrol logic 150. The row decoder 120 may operate in response to theoperating signal received from the control logic.

The data input/output circuit 130 may be connected to the control logic150. The data input/output circuit 130 may perform operations, e.g.,input and output, on the basis of the operating signal from the controllogic 150. The data input/output circuit 130 may provide an addressADDR, a command CMD, a control signal CTRL, and the like received fromthe memory controller 10 to the control logic 150.

The data input/output circuit 130 may provide input data to the pagebuffer circuit 140 through the data line DL. The data input/outputcircuit 130 may output the data DATA received from the page buffercircuit 140 to the outside.

The page buffer circuit 140 may receive an operating signal from thecontrol logic 150. The page buffer circuit 140 may perform operations,e.g., such as erase, verification, program, and so forth, in accordancewith the operating signal from the control logic 150.

The page buffer circuit 140 may be connected to the memory cell array160 via a bit line BL. The page buffer circuit 140 may provide the samevoltage to each bit line BL through the bit line BL at the time of anerase operation. The page buffer circuit 140 may apply a read voltage tothe bit line BL at the time of the verification operation to detect anerase result of the memory cell. The page buffer circuit 140 may apply aprogram voltage or an inhibit voltage to the bit line BL at the time ofthe program operation to program memory cells connected to the bit lineBL to which the program voltage is applied.

The control logic 150 may generate operating signals, e.g., erase,verification, and program, on the basis of a command CMD or a controlsignal CTRL from the memory controller 10. The control logic 150 mayprovide the generated operating signal to the voltage generator 110, therow decoder 120, the page buffer circuit 140, or the data input/outputcircuit 130.

The memory cell array 160 will be described below with reference toFIGS. 2 to 4. FIG. 3 illustrates a perspective view of a memory block ofthe memory cell array of FIG. 2. FIG. 4 illustrates a circuit diagram ofthe memory block of FIG. 3.

Referring to FIG. 2, the memory cell array 160 may be connected to therow decoder 120 through the GIDL line GL, the string selection line SSL,the word line WL, the ground selection line GSL, and common source lineCSL. The memory cell array 160 may be connected to the page buffercircuit 140 through the bit line BL.

The memory cell array 160 may include a plurality of memory blocks BLK1to BLKa. Each of the plurality of memory blocks BLK1 to BLKa may beconnected to the row decoder 120 through the GIDL line GL, a pluralityof word lines WL, at least one string selection line SSL, at least oneground selection line GSL, and a common source line CSL. In addition,each of the plurality of memory blocks BLK1 to BLKa may be connected tothe page buffer circuit 140 through a plurality of bit lines BL.

Referring to FIG. 3, each of the plurality of memory blocks BLK1 to BLKamay include a substrate SUB, a ground selection line GSL, a plurality ofword lines WL1 to WL7, a string selection line SSL, a GIDL line GL and aplurality of bit lines BL.

The ground selection line GSL, the plurality of word lines WL1 to WL7,the string selection line SSL, and the GIDL line GL may extend in thefirst direction X on the substrate SUB. Also, the plurality of bit linesBL may extend in a second direction Y on the substrate SUB.

The ground selection line GSL, the plurality of word lines WL1 to WL7,the string selection line SSL, the GIDL line GL, and the plurality ofbit lines BL may be stacked sequentially on the substrate SUB in a thirddirection Z.

Referring to FIG. 4, the memory block includes a plurality of cellstrings NS11 to NS33 arranged along the first direction X and the seconddirection Y. Each of the plurality of cell strings NS11 to NS33 mayinclude a GIDL transistor GT, a string selection transistor SST, aplurality of memory cells MC1 to MC7, and a ground selection transistorGST. The GIDL transistor GT, the string selection transistor SST, theplurality of memory cells MC1 to MC7, and the ground selectiontransistor GST may be connected in series along the third direction.

In FIG. 4, the number of cell strings, the number of bit lines, thenumber of string selection lines, and the number of ground selectionlines included in the memory block are illustrated as being 9, 3, 3, and3, respectively. However, this is only for the convenience ofdescription.

Each of the plurality of cell strings NS11 to NS33 may be connected toone of the plurality of bit lines BL1 to BL3 extending in the seconddirection Y. For example, the first, fourth, and seventh cell stringsNS11, NS21, and NS31 may be connected to the first bit line BL1. Thesecond, fifth, and eighth cell strings NS12, NS22, and NS32 may beconnected to the second bit line BL2. The third, sixth, and ninth cellstrings NS13, NS23 and NS33 may be connected to the third bit line BL3.

In some embodiments, each of the plurality of bit lines BL1 to BL3 maybe connected to the GIDL transistors GT of each of a plurality of cellstrings NS11 to NS33. In FIG. 4, each of the plurality of bit lines BLis illustrated as being connected to the GIDL transistor GT. In animplementation, the GIDL transistor GT may be below the ground selectiontransistor GST. At this time, each of the plurality of bit lines BL maybe connected to the string selection transistor SST.

Referring to FIGS. 2 and 4 again, the page buffer circuit 140 may applya voltage to each of the plurality of bit lines BL. For example, in theprogram operation, the page buffer circuit 140 may apply a programvoltage to the first bit line BL1 and may apply an inhibit voltage tothe second and third bit lines BL2 and BL3.

The GIDL transistor GT of each of the plurality of cell strings NS11 toNS33 may be connected to the GIDL line. In FIG. 4, the GIDL transistorsGT of each of the plurality of cell strings NS11 to NS33 are illustratedas being connected to one GIDL line GL.

The GIDL transistor GT may be used for an erase operation for erasing atleast some of the plurality of memory cells MC1 to MC7. For example, theGIDL transistor GT may generate a voltage for erasing at least some ofthe plurality of memory cells MC1 to MC7 on the basis of a difference involtages applied to the bit line BL and the GIDL line GL.

The string selection transistors SST of each of the plurality of cellstrings NS11 to NS33 may be connected to one of the plurality of stringselection lines SSL1 to SSL3 extending in the first direction X. Forexample, the string selection transistors SST of the first, second, andthird cell strings NS11, NS12 and NS13 may be connected to the firststring selection line SSL1. The string selection transistors SST of thefourth, fifth, and sixth cell strings NS21, NS22, and NS23 and thestring selection transistors SST of the seventh, eighth and ninth cellstrings NS31, NS32, and NS33 may be connected to the second stringselection line SSL2 and the third string selection line SSL3,respectively.

Referring to FIGS. 2 and 4 again, the row decoder 120 may select some ofa plurality of strings selection lines SSL1 to SSL3. For example, therow decoder 120 may apply a selection voltage to the first stringselection line SSL1, and may apply a non-selection voltage to the secondand third string selection lines SSL.

At this time, the string selection transistors SST of the first, second,and third cell strings NS11, NS12, and NS13 connected to the firststring selection line SSL1 may be activated. On the other hand, thestring selection transistors SST of the fourth to ninth cell stringsNS21 not NS33 connected to the second and third string selection linesSSL may not be activated.

A plurality of cell strings NS11 to NS33 may be arranged in a pluralityof rows and a plurality of columns by being connected to a plurality ofbit lines BL and a plurality of string selection lines SSL. For example,the first, fourth and seventh cell strings NS11, NS21 and NS31 connectedto the first bit line BL1 may be disposed in a single column along thesecond direction Y. The first, second and third cell strings NS11, NS12and NS13 connected to the first string selection line SSL1 may bearranged in a single row along the first direction X.

A plurality of memory cells MC1 to MC7 of each of the plurality of cellstrings NS11 to NS33 may be connected to a plurality of word lines WL,respectively. For example, the first memory cells MC1 of the pluralityof cell strings NS11 to NS33 may be connected to a single first wordline WL1. Similarly, the second to seventh memory cells MC2 to MC7 ofthe memory block may be connected to the second to seventh word linesWL2 to WL7, respectively. Each of the plurality of memory cells MC1 toMC7 may be used to store data. In some embodiments, each of theplurality of memory cells MC1 to MC7 may be used to store multi-bitdata.

The ground selection transistors GST of each of the plurality of cellstrings NS11 to NS33 may be connected to the common source line (CSL).Also, the ground selection transistors GST of the plurality of cellstrings NS11 to NS33 may be connected to one of the plurality of groundselection line GSL1 to GSL3 extending in the first direction. Forexample, the ground selection transistors GST of the first, second andthird cell strings NS11, NS12 and NS13 may be connected to the firstground selection line GSL1.

Referring to FIGS. 2 and 4 again, the row decoder 120 may select some ofthe plurality of ground select lines GSL1 to GSL3. For example, the rowdecoder 120 may apply a selection voltage to the first ground selectionline GSL and apply a non-selection voltage to the second and thirdground selection lines GSL2 and GSL3.

The cell string included in the memory cell array 160 will be describedwith reference to FIGS. 2 through 7. FIG. 5 is a circuit diagramillustrating the cell strings connected to one string selection line inthe memory block of FIG. 4. FIG. 6 illustrates one cell string in thecell string of FIG. 5.

Referring to FIGS. 4 and 5, the memory block may include a plurality ofcell strings NS11 to NS1 n connected to the first string selection lineSSL1. Although FIG. 5 illustrates only the plurality of cell stringsNS11 to NS1 n connected to the first string selection line SSL1, aplurality of cell strings connected to other string selection lines isalso similar.

Referring to FIG. 5, a plurality of cell strings NS11 to NS1 n may beconnected to a plurality of bit lines BL1 to BLn, respectively. A GIDLtransistor GT of each of the plurality of cell strings NS11 to NS1 n maybe connected to the GIDL line GL. A string selection transistor SST ofeach of the plurality of cell strings NS11 to NS1 n may be connected tothe first string selection line SSL1. Each of the plurality of memorycells MC1 to MC7 of each of the plurality of cell strings NS11 to NS1 nmay be connected to each of the plurality of word lines WL. A groundselection transistor GST of each of the plurality of cell strings NS11to NS1 n may be connected to a first ground selection line GSL.

Each of the plurality of cell strings NS11 to NS1 n may include a memorycell group including at least one memory cell. For example, the firstcell string NS11 may include a first memory cell group MCG1 a includingfive memory cells MC1 to MC5. Also, the second to n-th cell strings NS12to NS1 n may include first memory cell groups MCG2 a to MCGna eachincluding five memory cells MC1 to MC5, respectively. As anotherexample, the first cell string NS11 may include a first memory cellgroup MCG1 a including five memory cells MC1 to MC5 and a second memorycell group MCG1 b including two memory cells MC6 and MC7. In addition,the second to n-th cell strings NS12 to NS1 n may respectively includefirst memory cell groups MCG2 a to MCGna each including five memorycells MC1 to MC5, and second memory cell groups MCG2 b to MCGnb eachincluding two memory cells MC6 and MC7.

In FIG. 5, although the first to n-th cell strings NS11 to NS1 n areillustrated as including a memory cell group including five memory cellsand a memory cell group including two memory cells, respectively, anynumber of memory cell groups and any number of memory cells in a memorycell group may be employed.

Referring to FIG. 6, the first cell string NS11 may include a substrateSUB, a common source line CSL, a gate electrode 161, an insulating layer162, a charge trap layer 163, a core line 164, a core layer 165, and astring drain 166.

The common source line CSL is formed on the substrate SUB and may beconnected to the adjacent cell strings.

The gate electrode 161 and the insulating layer 162 may be alternatelystacked on the substrate SUB. The stacked gate electrode 161 may be usedas the ground selection line GSL, the plurality of word lines WL, thestring selection line SSL, and the GIDL line GL. Hereinafter, for theconvenience of description, the gate electrode 161 may be called theground selection line GSL, the plurality of word lines WL, the stringselection line SSL, and the GIDL line GL, respectively.

The charge trap layer 163 may be between the gate electrode 161 and theinsulating layer 162 and between the gate electrode 161 and the coreline 164. Although FIG. 6 illustrates that the charge trap layer 163includes one film, this is for the convenience of description, and thecharge trap layer 163 may include a plurality of layers.

The charge trap layer 163 may store the introduced electrons. Forexample, electrons present in the core line 164 may flow into the chargetrap layer 163 by a tunneling effect or the like. Electrons introducedinto the charge trap layer 163 may be fixed to the charge trap layer163. Electrons introduced into the charge trap layer 163 may not movealong the charge trap layer 163. For example, a first portion of thecharge trap layer 163 formed between the first word line WL and the coreline 164 may include the introduced electrons. At the same time, asecond portion of the charge trap layer 163 formed between the secondword line WL and the core line 164 may not include electrons.

An amount of electrons stored in the charge trap layer 163 may beexpressed as an electron level. For example, the first portion of thecharge trap layer 163 may be programmed to have electrons of a firstelectron level. Also, the second portion of the charge trap layer 163may be programmed at a second electron level different from the firstelectron level.

The core line 164 may be connected to the bit line BL through the stringdrain 166. The core line 164 may be connected to the common source lineCSL through the substrate SUB.

The ground selection line GSL may be used as a gate of the groundselection transistor GST. For example, the ground selection line GSL, apart of the charge trap layer 163 between the ground selection line GSLand the core line 164, and a part of the core line 164 at the same levelas the ground selection line GSL may form a ground selection transistorGST.

Similarly, each of the plurality of word lines WL may be used as a gateof each of the plurality of memory cells MC1 to MC7. The stringselection lines SSL and the GIDL line GL may also be used as a gate ofthe string selection transistor SST and the GIDL transistor,respectively.

The core line 164 may be between the string drain 166 and the substrateSUB and may surround the core layer 165. That is, the core line 164 maybe a trench filled with the core layer 165. The core layer 165 mayinclude an insulating material. For example, the core layer 165 mayinclude silicon oxide.

The core line 164 may be used as a channel through which a current flowsbetween the string drain 166 and the common source line CSL. Forexample, the core line 164 may be controlled by the voltage applied tothe ground selection line GSL, the plurality of word lines WL, thestring selection line SSL, and the GIDL line GL between the commonsource line CSL and the string drain 166.

For example, when an operation of reading the first memory cell MC1 isperformed, a bit line read voltage may be applied to the first bit lineBL1. A selection voltage may be applied to the GIDL line GL, the stringselection line SSL, and the ground selection line GSL. A read passvoltage may be applied to the second to seventh word lines WL. A wordline read voltage may be applied to the first word line WL. A sourcevoltage (e.g., OV) may be applied to the common source line CSL. At thistime, all the remaining transistors except the first memory cell MC1 maybe activated.

When the first memory cell MC1 is not programmed, the first memory cellMC1 may be activated by the word line read voltage. When the firstmemory cell MC1 is programmed, the first memory cell MC1 may not beactivated by the word line read voltage.

In this way, the core line 164 may be activated only when the firstmemory cell MC1 is not programmed. Therefore, the first memory cell MC1may be read via the presence or absence of activation of the core line164.

The operation of the GIDL transistor included in the cell string will bedescribed below with reference to FIGS. 5, 6, 7 8 a and 8 b. FIG. 7illustrates a GIDL transistor included in the cell string of FIG. 6.FIG. 8a illustrates the operation of the GIDL transistor of FIG. 7. FIG.8b is an enlarged view of a region A of FIG. 8 a.

In FIG. 7, the GIDL transistor GT may be formed as a gate electrode 161,a part of the charge trap layer 163, and a part of the core line 164.The core line 164 may be connected to the string drain 166 and thecommon source line CSL. The gate electrode 161 of the GIDL transistor GTmay be a part of the GIDL line GL of FIG. 6. The charge trap layer 163may include a first silicon oxide layer 163 b, a silicon nitride layer163 a, and a second silicon oxide layer 163 c, which are sequentiallystacked.

The silicon nitride layer 163 a may include the introduced electrons.The first silicon oxide layer 163 b may block electrons introduced intothe silicon nitride layer 163 a from being emitted to the core line 164.The second silicon oxide layer 163 c may block the electrons introducedinto the silicon nitride layer 163 a from being emitted to the gateelectrode 161.

In FIG. 7, the GIDL transistor GT is illustrated as including the drainD and the source S formed on the core line 164 for convenience ofexplanation. In an implementation, the drain D and the source Sillustrated in FIG. 7 may be the string drain 166 and the common sourceline CSL illustrated in FIG. 6. That is, the drain D and the source Smay not be formed on the core line 164.

The GIDL transistor GT may be programmed to have a predeterminedelectronic level. For example, electrons of a predetermined electronlevel may flow into the charge trap layer 163 of the GIDL transistor,and the charge trap layer 163 of the GIDL transistor may store theflowed electrons.

Referring to FIGS. 8a and 8b , the GIDL transistor GT may generate agate induced drain leakage current, i.e., the GIDL current. The GIDLcurrent may be generated by a difference between the gate voltage VGapplied to the gate electrode 161 and the drain voltage VD applied tothe drain. For example, the GIDL current may be generated when the gatevoltage VG is smaller than the drain voltage VD.

When the gate voltage VG is smaller than the drain voltage VD, adeficient region forming the drain D may be decrease. For example, thedeficient region of a drain D′ when the gate voltage VG is smaller thanthe drain voltage VD may be smaller than the deficient region of thedrain D of other cases.

When deficient region of the drain D decreases, a hole-electron pair maybe generated. The hole-electron pair may be separated into holes andelectrons. The separated electrons may be discharged to the outside(e.g., bit line) of the GIDL transistor GT through the drain D.

The separated holes flow into the core line 164. The amount of holesflowing into the core line 164 may be expressed as a hole level. Forexample, the core line 164 may include holes of a predetermined holelevel. Holes included in the core line 164 may form a core line voltage.

The amount of holes generated by the GIDL transistor GT may bedetermined by the amount of electrons contained in the charge trap layer163 of the GIDL transistor GT. For example, if the GIDL transistor GT isprogrammed at the first electron level, the amount of holes generated bythe GIDL transistor GT may be determined by the gate voltage VG, thedrain voltage, and the voltage formed by the electrons of the firstelectron level of the charge trap layer 163. Specifically, when the GIDLtransistor GT is programmed at a higher electronic level, the amount ofholes generated in the GIDL transistor GT increases. In this way, themagnitude of the core line voltage of the core line 164 may be increasedby programming the GIDL transistor GT.

The plurality of memory cells MC1 to MC7 included in the cell string maybe affected by the core line voltage generated by the GIDL transistorGT. For example, some of the plurality of memory cells MC1 to MC7 may beerased by a difference between the word line erase voltage applied to atleast some of the plurality of word lines WL and the core line voltageof the core line 164. For example, electrons included in the charge traplayer 163 of the first memory cell group MCG1 a may be discharged to thecore line 164 due to the difference between the word line erase voltageand the core line voltage.

Referring to FIGS. 2 and 5 again, when the control logic 150 receives anerase command, the control logic 150 may execute an erase work on atleast one of the plurality of memory blocks of the memory cell array160. For example, the control logic 150 may perform erase operations,verification operations, GIDL program operations, and GIDL recoveryoperations on some memory blocks of the memory cell array 160.

The control logic 150 may include a GIDL program controller 154. TheGIDL program controller 154 may perform the GIDL program operation andthe GIDL recovery operation included in the erase loop. For example, theGIDL program controller 154 may perform erase operations, verificationoperations, GIDL program operations, and GIDL recovery operations onsome memory blocks of the memory cell array 160.

In FIG. 5, the plurality of memory cells MC1 to MC7 may include a firstmemory cell region MCR1 and a second memory cell region MCR2. Forexample, the first memory cell region may include first memory cellgroups MCG1 a to MCGna. The second memory cell region may include secondmemory cell groups MCG1 b to MCGnb.

In some embodiments, the erase work may include a first erase work of afirst memory cell region MCR1 among a plurality of memory cells MC1 toMC7, and a second erase work of a second memory cell region MCR2. Forexample, the erase work may execute the second erase work of the secondmemory cell region MCR2 after completing the first erase work of thefirst memory cell region MCR1.

The erase work may include a plurality of erase loops. For example, theerase work may include a first erase loop and a second erase loop. Thefirst erase loop may include an erase operation, a verificationoperation, and a GIDL program operation. The second erase loop mayinclude an erase operation, a verification operation, and a GIDLrecovery operation.

The erase operation may recover the plurality of memory cells MC1 to MC7included in each of the plurality of cell strings NS11 to NS33 to astate before being programmed. For example, when the erase operation isperformed, electrons stored in the charge trap layer 163 may be emittedto the core line 164. At this time, the electron level of the chargetrap layer 163 of the memory cell MC may be lowered.

In the erase operation according to some embodiments, the same bit lineerase voltage (e.g., 18V) may be applied to each of the plurality of bitlines BL. In some embodiments, the non-volatile memory device may saveresources by applying the same voltage to each of the plurality of bitlines BL in the erase operation. This is because additional resourcesare needed to apply different erase voltages for each bit line in theerase operation.

In the erase operation, a GIDL line voltage (e.g., 10V) smaller than thebit line erase voltage may be applied to the GIDL line GL. If the GIDLline voltage (e.g., 10V) is smaller than the bit line voltage (e.g.,18V) connected to the drain D of the GIDL transistor GT, the GIDLtransistor GT may generate holes. Holes generated by the GIDL transistorGT may be applied to the core line 164 to form a core line voltage.

In the erase operation, a word line erase voltage (e.g., 0.6V) smallerthan the core line voltage formed by the GIDL transistor GT may beapplied to the word line WL connected to the plurality of cell stringsNS11 to NS33. Each of the plurality of memory cells MC1 to MC7 includedin the plurality of cell strings NS11 to NS33 may be erased by thedifference between the word line erase voltage and the core linevoltage.

In some embodiments, the erase operation may erase only some of aplurality of memory cells MC1 to MC7. For example, the erase operationmay erase the first memory cell region MCR1 and may not erase the secondmemory cell region MCR2. In this case, an erase voltage (e.g., 0.6V) maybe applied to the word line WL connected to the first memory cell regionMCR1. Also, an erase pass voltage (e.g., 12V) may be applied to the wordline WL connected to the second memory cell region MCR2.

The verification operation may detect the erase results of a pluralityof memory cells MC1 to MC7 connected to each of a plurality of cellstrings NS11 to NS33.

The erase results may be determined by the electron level contained inthe charge trap layer 163 of the memory cell. If the electron levelcontained in the charge trap layer 163 of the memory cell is smallerthan the predetermined verification electron level, it may be consideredthat the erase is completed.

A threshold voltage of the memory cell may be determined by theelectronic level contained in the charge trap layer 163 of the memorycell MC. Therefore, the erase results may be determined that the eraseis completed when the threshold voltage of the memory cell is smallerthan the predetermined verification voltage.

When the verification operation is performed, the page buffer circuit140 may receive the erase results of the memory cell MC connected toeach of the plurality of cell strings NS11 to NS33 via the bit line BL.

As an example, if the erase of the plurality of memory cells MC1 to MC7connected to each of the first cell string NS11 is completed, the pagebuffer circuit 140 may receive an erase success (PASS) signal throughthe first bit line BL1.

As another example, when the erase of at least one of the plurality ofmemory cells MC1 to MC7 connected to each of the first cell string NS11is not completed, the page buffer circuit 140 may receive an erasefailure (FAIL) signal through the first bit line BL1.

In the verification operation, a verification voltage (e.g., 0.5V) maybe applied to a plurality of word lines WL connected to a plurality ofmemory cells MC1 to MC7 of a plurality of cell strings NS11 to NS33.

In some embodiments, the verification operation may verify only theerased memory cells among the plurality of memory cells MC1 to MC7. Forexample, the verification operation may verify the erased first memorycell region MCR1 and may not verify the non-erased second memory cellregion MCR2. In this case, a verification voltage (e.g., 0.5V) may beapplied to the word line WL connected to the first memory cell regionMCR1. Also, a verification pass voltage (e.g., 6V) may be applied to theword line WL connected to the second memory cell region MCR2.

The GIDL program operation may program the GIDL transistors included insome of the plurality of cell strings NS11 to NS33. For example, theprogram voltage may be applied to the first bit line BL1 to program theGIDL transistor of the first cell string NS11, and the inhibit voltagemay be applied to the remaining bit lines BL not to program the GIDLtransistor GT of the remaining cell strings.

When the GIDL program operation is performed, the charge trap layer 163of the GIDL transistor GT included in some of the plurality of cellstrings NS11 to NS33 may have an increased electron level. As the firsterase loop is repeated, by programming the GIDL transistor GT of thecell string including the non-erased memory cell MC, a higher erasevoltage may be applied to the cell string.

The degree of program of the GIDL transistor GT may be represented by alevel. For example, the level of the GIDL transistor GT in which theGIDL transistor GT is programmed may increase. Also, when the GIDLtransistor GT is programmed at a high level, the electron levelcontained in the charge trap layer of the GIDL transistor GT is high.

As the first erase loop is repeated, each of the GIDL transistors GT ofsome cell strings of the plurality of cell strings may be programmed atdifferent levels. For example, the GIDL transistor GT of the first cellstring NS11 may be programmed at the first level. The GIDL transistor GTof the second cell string NS12 may be programmed at the second levelsmaller than the first level. At this time, the first level and thesecond level may be determined depending on the number of times at whicheach GIDL transistor is programmed.

The GIDL program operation may program a GIDL transistor GT included insome of the plurality of cell strings NS11 to NS33 depending on theerase result of the verification operation. For example, the GIDLprogram operation may program the GIDL transistor GT included in thefirst cell string NS11 determined that the erase is not completed. Atthe same time, the GIDL program operation may not program the GIDLtransistor GT included in the second cell string NS12 determined thatthe erase is completed.

The GIDL program operation according to some embodiments may program theGIDL transistor GT of the first cell string NS11 and may not program theGIDL transistor GT of the second cell string NS12. In this case, aprogram voltage (e.g., OV) may be applied to the first bit line BL1connected to the first cell string NS11. In addition, an inhibit voltage(e.g., 2V) different from the program voltage may be applied to thesecond bit line BL connected to the second cell string NS12. In animplementation, the program voltage may be smaller than the inhibitvoltage. Also, in this case, in the GIDL program operation, the GIDLprogram voltage (e.g., 18V) may be applied to the GIDL line connected tothe plurality of cell strings NS11 to NS33.

The GIDL recovery operation may recover all GIDL transistors included inthe plurality of cell strings NS11 to NS33. For example, the GIDLprogram controller 154 may apply a GIDL erase voltage to each of aplurality of bit lines BL to recover all the GIDL transistors GTincluded in the plurality of cell strings NS11 to NS33 to a state beforebeing programmed.

When the GIDL recovery operation is performed, electrons stored in thecharge trap layer 163 of all GIDL transistors GT included in theplurality of cell strings NS11 to NS33 may be discharged to the coreline 164.

In some embodiments, the GIDL recovery operation may set the charge traplayer 163 of all the GIDL transistors GT at an initial electronic level.That is, the GIDL recovery operation may recover the electron level ofthe GIDL transistor GT increased by the first erase loop to an initialvalue.

The verification operation may determine which erase loop among thefirst erase loop or the second erase loop is executed. For example, ifthe erase of all the memory cells to be verified is completed, the eraseresult may be a success (PASS). If the erase of at least one of thememory cells to be verified is not completed, the erase result may be afailure (FAIL).

If the erase result is the failure (FAIL), the GIDL program operationmay be performed after the verification operation. At this time, theGIDL program operation may program GIDL transistors included in a cellstring in which the erase is not completed

If the erase result is the success (PASS), a GIDL recovery operation maybe performed after the verification operation. At this time, the GIDLtransistors included in all cell strings may be recovered to the statebefore being programed.

The erase work may include a plurality of first erase loops and a singlesecond erase loop. For example, the first erase loop may be performedrepeatedly before the erase result is a success (PASS). If the eraseresult is a success (PASS), a second erase loop may be performed once tocomplete the erase work.

The erase work performed by the control logic 150 and the GIDL programcontroller 154 will be specifically described below with reference toFIGS. 2, 5, 9 a and 9 b. FIGS. 9a and 9b are diagrams illustratingthreshold voltage illustrating the erase work of the memory device ofFIG. 2. For reference, FIGS. 9a and 9b are views illustrating the GIDLtransistors GT of the first and second cell strings NS11 and NS12 ofFIG. 5 and a threshold voltage V_th of one memory cell MC of a pluralityof memory cells.

The threshold voltages of the GIDL transistors GT and the memory cellsMC of the first and second cell strings NS11 and NS12 may be determinedby the electronic level included in the charge trap layers of eachtransistor in FIGS. 9a and 9b . For example, if the GIDL transistor GThas a high electron level, the gate voltage for activating the GIDLtransistor GT may be increased by the voltage generated by the electronsof the charge trap layer of the GIDL transistor GT. The same alsoapplies to the case of the memory cell MC.

Referring to FIG. 9a , a first erase loop LOOP1 may include an eraseoperation, a verification operation, and a GIDL program operation.

In the erase operation, the GIDL transistors GT of each of the first andsecond cell strings NS11 and NS12 may have threshold voltages of V_GT1and V_GT2, respectively. At this time, the threshold voltage of V_GT1and V_GT2 may mean a non-programmed threshold voltage.

In the erase operation, the memory cells MC of each of the first andsecond cell strings NS11 and NS12 may be erased. For example, thethreshold voltage of the memory cell MC of the first cell string NS11may be V_MC1 which is greater than the verification voltage. Also, thethreshold voltage of the memory cell MC of the second cell string NS12may be V_MC2 which is smaller than the verification voltage.

In the verification operation, the threshold voltage of the GIDLtransistors GT of each of the first and second cell strings NS11 andNS12 may not change. In the verification operation, the erase results ofthe memory cells MC of each of the first and second cell strings NS11and NS12 may be detected.

For example, the threshold voltage V_MC1 of the memory cell MC of thefirst cell string NS11 may be greater than a verification voltageV_verify. That is, the memory cell MC of the first cell string NS11 maybe determined that the erase is not completed.

Also, the threshold voltage V_MC2 of the memory cell MC of the secondcell string NS12 may be smaller than the verification voltage V_verify.That is, the memory cell MC of the second cell string NS12 may bedetermined that the erase is completed.

The verification operation may determine that the erase of at least onememory cell MC among the memory cells MC of each of the first and secondcell strings is not completed. Therefore, the erase result of theverification operation may be determined as a failure (FAIL).

In the GIDL program operation, the GIDL transistor of the first cellstring NS11 may be programmed. For example, the threshold voltage of theGIDL transistor of the first cell string NS11 may be changed from V_GT1to V_GT1′.

In the GIDL program operation, the GIDL transistor of the second cellstring NS12 may not be programmed. For example, the threshold voltage ofthe GIDL transistor of the second cell string NS12 may be maintained atV_GT2.

Referring to FIG. 9b , the second erase loop LOOP2 may include an eraseoperation, a verification operation, and a GIDL recovery operation.

In the erase operation, the GIDL transistors GT of each of the first andsecond cell strings NS11 and NS12 may have threshold voltages of V_GT1′and V_GT2, respectively. In the erase operation, the memory cells MC ofeach of the first and second cell strings NS11 and NS12 may be erased.

For example, the memory cell MC of the first cell string NS11 may beerased with a voltage higher than the erase voltage in the first eraseloop LOOP1. Therefore, the threshold voltage of the memory cell MC ofthe first cell string NS11 may be changed to V_MC1′ smaller than theverification voltage.

The memory cells MC of the second cell string NS12 may be erased at thesame voltage as the erase voltage in the first erase loop LOOP1.Therefore, the threshold voltage of the memory cell MC of the secondcell string NS12 may be maintained at V_MC2.

Also, for convenience of explanation, FIG. 9b illustrates a case wherethe threshold voltage of the memory cell MC of the second cell stringNS12 is not changed by the erase operation. In an implementation, whenthe erase operation of the second erase loop is performed, the thresholdvoltage of the memory cell MC of the second cell string NS12 may furtherdecrease.

In the verification operation, the threshold voltages of the GIDLtransistors GT of each of the first and second cell strings NS11 andNS12 may not change. In the verification operation, the erase results ofthe memory cells MC of each of the first and second cell strings NS11and NS12 may be detected.

For example, the threshold voltage V_MC1′ of the memory cell MC of thefirst cell string NS11 may be smaller than the verification voltageV_verify. That is, the memory cell MC of the first cell string NS11 maybe determined that the erase is completed.

Also, the threshold voltage V_MC2 of the memory cell MC of the secondcell string NS12 may be smaller than the verification voltage V_verify.That is, the memory cell MC of the second cell string NS12 may bedetermined that the erase is completed.

All the memory cells MC of each of the first and second cell stringsNS11 and NS12 may be determined by the verification operation that theerase is completed. Therefore, the erase result of the verificationoperation may be determined as a success (PASS).

In the GIDL recovery operation, the GIDL transistor GT of the first andsecond cell strings NS11 and NS12 may be recovered to the state beforebeing programmed. For example, the threshold voltage of the GIDLtransistor of the first cell string NS11 may be changed from V_GT1′ backto V_GT1.

Hereinafter, effects of the non-volatile memory system according to someembodiments will be described with reference to FIGS. 2, 9 a, 9 b, and10. FIG. 10 illustrates the effect of the erase work performed by thememory device of FIG. 2. For reference, FIG. 10 illustrates thresholdvoltage distributions of a plurality of memory cells checked by theverification operations of the first erase loop LOOP1 and the seconderase loop LOOP2.

Referring to FIG. 10, in the verification operation of the first eraseloop LOOP1, memory cells of a plurality of cell strings included in aspecific memory block of the memory cell array 160 may have thresholdvoltages of the first distribution. For example, the plurality of cellstrings may include a first cell string group NSG1 and a second cellstring group NSG2.

The threshold voltage of the memory cell of the first cell string groupNSG1 may be smaller than the verification voltage V_verify. The firstcell string group NSG1 may be determined that the erase is completed.

The threshold voltage of the memory cell of the second cell string groupNSG2 may be larger than the verification voltage V_verify. That is, thesecond cell string group NSG2 may be determined that the erase is notcompleted.

In the verification operation of the second erase loop LOOP2, the memorycells of the plurality of cell strings included in the memory block mayhave threshold voltages of the second distribution.

For example, in the GIDL program operation of the first erase loopLOOP1, the GIDL transistor GT of the second cell string group NSG2 isprogrammed, and the threshold voltage of the second cell string groupNSG2 may be changed to the verification voltage or less.

In this way, as only the threshold voltage of the second cell stringgroup NSG2 decreases, the second distribution may have a range narrowerthan the first distribution.

As a result, by programming the GIDL transistors for each cell string,the erase operations of the entire memory cell may be finely performed.The erase operations may suppress or reduce the occurrence of deeplyerased memory cells, which may result in excess holes. Thus, thereliability of the non-volatile memory device can be increased.

The memory device according to some embodiments will be described belowwith reference to FIGS. 2 and 11. FIG. 11 illustrates one side of thememory block in the memory cell array of the memory device according tosome embodiments.

Referring to FIG. 11, the GIDL transistor GT may be under the groundselection transistor GST. In this case, the bit line BL may be connectedto the string selection transistors SST of the plurality of cell stringsNS11 to NS33.

The GIDL transistor GT may be directly connected to the common sourceline CSL. The GIDL transistor GT may generate holes on the basis of thedifference between the source voltage applied to the common source lineCSL and the gate voltage applied to the GIDL line. The generated holesmay flow into the core line 164 to form a core line voltage. Forexample, in the erase operation, the source voltage (e.g., 18V) appliedto the common source line CSL may be greater than the voltage (e.g.,10V) applied to the GIDL line.

Hereinafter, an erase method of the memory device according to someembodiments will be described with reference to FIGS. 2, 5 and 12. FIG.12 is a flowchart for explaining the erase method of the memory deviceaccording to some embodiments.

Referring to FIG. 12, the erase method includes an erase operation(S110), a verification operation (S120), a GIDL transistor programoperation (S130), and a GIDL transistor recovery operation (S140).

A plurality of memory cells MC1 to MC7 included in the plurality of cellstrings NS11 to NS33 may be erased in the erase operation (S110). In theverification operation (S120), erase results of a plurality of memorycells MC1 to MC7 included in a plurality of cell strings NS11 to NS33may be verified.

If the erase result is determined as a failure (FAIL) in theverification operation (S120), a GIDL transistor program operation(S130) may be performed. In the GIDL transistor program operation(S130), some GIDL transistors GT of a plurality of cell strings NS11 toNS33 may be programmed.

If the erase result is determined as a success (PASS) in theverification operation (S120), a GIDL transistor recovery operation(S140) may be performed. In the GIDL transistor recovery operation(S140), the GIDL transistors GT of the plurality of cell strings NS11 toNS33 may be recovered to a state before being programmed.

The erase method of the memory device according to some embodiments willbe described with reference to FIGS. 2, 5, 12 and 13 of the presentapplication. FIG. 13 is a flowchart for explaining the erase method ofthe memory device according to some embodiments.

Referring to FIG. 13, the erase method includes a first region eraseoperation (S200) and the second region erase operation (S300).

The first region erase operation (S200) includes an erase operation(S210) of erasing memory cells of the first memory cell region MCR1, anda verification operation (S220) of erasing the memory cells of the firstmemory cell region MCR1.

Also, the first region erase operation (S200) includes a GIDL transistorprogram operation (S230) of programming the GIDL transistors included insome of the plurality of cell strings NS11 to NS33 and a GIDL transistorrecovery operation (S240), which are executed on the basis of the eraseresult of the verification operation (S220).

The second region erase operation (S300) includes an erase operation(S310) of erasing the memory cells of the second memory cell regionMCR2, and a verification operation (S320) of erasing the memory cells ofthe second memory cell region MCR2.

Also, the second region erase operation S300 includes a GIDL transistorprogram operation (S330) of programming the GIDL transistors included insome of the plurality of cell strings NS11 to NS33 and a GIDL transistorrecovery operation (S340), which are executed on the basis of the eraseresult of the verification operation (S320).

By way of summation and review, one or more embodiments may provide ahighly reliable non-volatile memory device by reducing or suppressing anoccurrence of deep erase cell. One or more embodiments may provide anerase method of the highly reliable non-volatile memory device byreducing or suppressing the occurrence of deep erase cell.

Embodiments are described, and illustrated in the drawings, in terms offunctional blocks, units, modules, and/or methods. Those skilled in theart will appreciate that these blocks, units, modules, and/or methodsare physically implemented by electronic (or optical) circuits such aslogic circuits, discrete components, microprocessors, hard-wiredcircuits, memory elements, wiring connections, and the like, which maybe formed using semiconductor-based fabrication techniques or othermanufacturing technologies. In the case of the blocks, units, modules,and/or methods being implemented by microprocessors or similar, they maybe programmed using software (e.g., microcode) to perform variousfunctions discussed herein and may optionally be driven by firmwareand/or software. Alternatively, each block, unit, module, and/or methodmay be implemented by dedicated hardware, or as a combination ofdedicated hardware to perform some functions and a processor (e.g., oneor more programmed microprocessors and associated circuitry) to performother functions. Also, each block, unit, and/or module of theembodiments may be physically separated into two or more interacting anddiscrete blocks, units and/or modules without departing from the scopeof the disclosure. Further, the blocks, units and/or modules of theembodiments may be physically combined into more complex blocks, unitsand/or modules without departing from the scope of the disclosure.

Example embodiments have been disclosed herein, and although specificterms are employed, they are used and are to be interpreted in a genericand descriptive sense only and not for purpose of limitation. In someinstances, as would be apparent to one of ordinary skill in the art asof the filing of the present application, features, characteristics,and/or elements described in connection with a particular embodiment maybe used singly or in combination with features, characteristics, and/orelements described in connection with other embodiments unless otherwisespecifically indicated. Accordingly, it will be understood by those ofskill in the art that various changes in form and details may be madewithout departing from the spirit and scope of the present invention asset forth in the following claims.

What is claimed is:
 1. An erase method of a non-volatile memory device,which includes a memory cell array including a first cell stringconnected to a first bit line and including a first gate-induced drainleakage (GIDL) transistor and a first memory cell group and a secondcell string connected to a second bit line and including a second GIDLtransistor and a second memory cell group, a GIDL line connected togates of the first and second GIDL transistors, and a first word linegroup including a plurality of word lines connected to each memory cellof the first and second memory cell groups, the first and second GIDLtransistors both being programmed to a first level, the methodcomprising: performing a first erase operation of the first and secondmemory cell groups by applying a bit line erase voltage to each of thefirst and second bit lines, by applying a GIDL line voltage to the GIDLline, and by applying an erase voltage to each word line of the firstword line group, performing a first verification operation of the firsterase operation by applying a verification voltage to each word line ofthe first word line group, performing a program operation of the firstGIDL transistor by applying a program voltage to the first bit line toprogram the first GIDL transistor to a second level higher than thefirst level, and after the performing the program operation, performinga second erase operation of the first and second memory cell groups byapplying the bit line erase voltage to each of the first and second bitlines, by applying the GIDL line voltage to the GIDL line, and byapplying the erase voltage to each word line of the first word linegroup.
 2. The method of claim 1, wherein the performing the programoperation further includes applying a inhibit voltage different from theprogram voltage to the second bit line.
 3. The method of claim 2,wherein the performing the program operation further includes applying aGIDL program voltage to the GIDL line different from the programvoltage.
 4. The method of claim 3, wherein the GIDL program voltage isgreater than the program voltage and the inhibit voltage.
 5. The methodof claim 2, wherein, during the program operation, the second GIDLtransistor is maintained at the first level.
 6. The method of claim 1,wherein the program operation is performed when a threshold voltage ofthe memory cell of the first memory cell group is greater than theverification voltage and a threshold voltage of the memory cell of thesecond memory cell group is less than the verification voltage.
 7. Themethod of claim 1, further comprising: performing a second verificationoperation of the second erase operation by applying the verificationvoltage to each word line of the first word line group, and performing aGIDL recovery operation of the first and second GIDL transistors byapplying a GIDL erase voltage to each of the first and second bit lines.8. The method of claim 7, wherein the GIDL recovery operation isperformed when a threshold voltage of the memory cell of each of thefirst and second memory cell groups is less than the verificationvoltage.
 9. The method of claim 1, wherein: the first cell stringfurther includes a third memory cell group different from the firstmemory cell group, the second cell string further includes a fourthmemory cell group different from the second memory cell group, thememory cell array further includes a second word line group including aplurality of word lines connected to each memory cell of the third andfourth memory cell groups, and the performing the first erase operationfurther includes applying an erase pass voltage greater than the erasevoltage to each word line of the second word line group.
 10. The methodof claim 9, wherein the performing the first verification operationfurther includes applying the verification voltage to each word line ofthe second word line group.
 11. An erase method of a non-volatile memorydevice, which includes a memory cell array including a first cell stringconnected to a first bit line and including a first gate-induced drainleakage (GIDL) transistor and a first memory cell group and a secondcell string connected to a second bit line and including a second GIDLtransistor and a second memory cell group, a GIDL line connected togates of the first and second GIDL transistors, and a plurality of wordlines connected to each memory cell of the first and second memory cellgroups, the first and second GIDL transistors both being programmed to afirst level, the method comprising: performing a program operation ofthe first GIDL transistor by applying a program voltage to the first bitline and by applying a inhibit voltage greater than the program voltageto the second bit line, and after the performing the program operation,performing an erase operation of the first and second memory cell groupsby applying a bit line erase voltage to each of the first and second bitlines.
 12. The method of claim 11, wherein the first GIDL transistor isprogrammed to a second level higher than the first level and the secondGIDL transistor is maintained at the first level by performing theprogram operation.
 13. The method of claim 11, wherein the performingthe program operation further includes applying a GIDL program voltagegreater than the program voltage and the inhibit voltage to the GIDLline.
 14. The method of claim 11, further comprising, after theperforming the erase operation, performing a GIDL recovery operation ofthe first and second GIDL transistors by applying a GIDL erase voltageto each of the first and second bit lines.
 15. The method of claim 14,wherein the GIDL recovery operation is performed when a thresholdvoltage of the memory cell of each of the first and second memory cellgroups is less than a verification voltage.
 16. The method of claim 11,wherein: the first memory cell group is between the first GIDLtransistor and the first bit line, and the second memory cell group isbetween the second GIDL transistor and the second bit line.
 17. Themethod of claim 11, wherein: the first GIDL transistor is directlyconnected to the first bit line, and the second GIDL transistor isdirectly connected to the second bit line.
 18. An erase method of anon-volatile memory device, which includes a memory cell array includinga first cell string connected to a first bit line and including a firstgate-induced drain leakage (GIDL) transistor and a first memory cellgroup and a second cell string connected to a second bit line andincluding a second GIDL transistor and a second memory cell group, aGIDL line connected to gates of the first and second GIDL transistors,and a plurality of word lines connected to each memory cell of the firstand second memory cell groups, the method comprising: performing a firsterase operation of the first and second memory cell groups by applying abit line erase voltage to each of the first and second bit lines,performing a program operation of the first GIDL transistor by applyinga program voltage to the first bit line and by applying a inhibitvoltage greater than the program voltage to the second bit line, when athreshold voltage of the memory cell of the first memory cell group isgreater than a verification voltage and a threshold voltage of thememory cell of the second memory cell group is less than theverification voltage, and after the performing the program operation,performing a second erase operation of the first and second memory cellgroups by applying a bit line erase voltage to each of the first andsecond bit lines.
 19. The method of claim 18, wherein the performing theprogram operation further includes applying a GIDL program voltagegreater than the program voltage and the inhibit voltage to the GIDLline.
 20. The method of claim 18, further comprising after theperforming the second erase operation, performing a GIDL recoveryoperation of the first and second GIDL transistors by applying a GIDLerase voltage to each of the first and second bit lines.